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Growth, Characterisation, And Properties of Bi1.8Lu1.2Fe3.6Al1.4O12 Garnet Films Prepared Using Two Different Substrate Temperatures

机译:使用两种不同的基底温度制备的Bi1.8Lu1.2Fe3.6Al1.4O12石榴石薄膜的生长,表征和性能

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摘要

We prepare highly Bismuth substituted iron garnet of composition type Bi1.8Lu1.2Fe3.6Al1.4O12 by using low and high substrate temperatures (250°C and 680°C) during the deposition process inside the vacuum chamber of RF magnetron sputtering system. The crystallisation process of this garnet type thin film materials are performed by means of optimised high temperature oven annealing process and conduct several characterisation techniques to obtain and evaluate their properties. All the optimally annealed samples possess very promising and attractive properties. Comparatively low coercive force (below 15 Oe) is achieved in garnet films prepared at high substrate temperature of 680°C, simultaneously with high MO quality and almost in-plane magnetisation direction, which are the properties desired in various MO sensing, switching and imaging applications.
机译:我们通过在射频磁控溅射系统真空室内的沉积过程中使用高低的衬底温度(250°C和680°C)来制备成分类型为Bi1.8Lu1.2Fe3.6Al1.4O12的高铋取代铁石榴石。这种石榴石型薄膜材料的结晶过程是通过优化的高温烘箱退火过程来进行的,并进行了几种表征技术以获得并评估其性能。所有经过最佳退火的样品都具有非常有前途的吸引力。在680°C的高基材温度下制备的石榴石薄膜具有较低的矫顽力(低于15 Oe),同时具有较高的MO质量和几乎面内的磁化方向,这是各种MO感测,切换和成像所需的特性应用程序。

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